• 810-800256-207 | RF Power Supply Module,jlplc
  • 810-800256-207 | RF Power Supply Module,jlplc
  • 810-800256-207 | RF Power Supply Module,jlplc
  • 810-800256-207 | RF Power Supply Module,jlplc

810-800256-207 | RF Power Supply Module

Product Model LAM 810-800256-207
Manufacturer Lam Research
Product Type RF Power Supply Module
Output Power 600–1000 W (typical range)
  • 810-800256-207 | RF Power Supply Module,jlplc
  • 810-800256-207 | RF Power Supply Module,jlplc

Desciption

Product Overview

The LAM 810-800256-207 is a high-precision RF power supply module designed for use in semiconductor manufacturing and plasma processing equipment. Developed by Lam Research, a global leader in wafer fabrication systems, this unit provides stable, reliable RF energy to sustain plasma during critical etch and deposition processes. Its advanced design ensures consistent power delivery, superior impedance matching, and exceptional operational stability even under dynamic process conditions.

The LAM 810-800256-207 is engineered to meet the stringent requirements of semiconductor fabrication, where process repeatability and equipment uptime are essential. With precise power control and robust thermal management, this RF power supply delivers optimized plasma uniformity, contributing to improved yield and reduced process variability. Compact and easy to integrate, it is ideal for both system upgrades and maintenance replacements within Lam Research plasma etchers and related process chambers.

Hainan Jinlin Mechanical & Electrical is a distributor of industrial control products, specializing in a wide range of brands. We possess extensive industry knowledge and market insights. Adhering to the “Customer First, Forge Ahead” business philosophy, we provide high-quality customer service. We’re here for you, dedicated to meeting your needs!


Technical Specifications

Parameter Value
Product Model LAM 810-800256-207
Manufacturer Lam Research
Product Type RF Power Supply Module
Output Power 600–1000 W (typical range)
Frequency Range 13.56 MHz
Cooling Method Forced Air or Liquid Cooling
Operating Temperature 0°C to +45°C
Input Voltage 208–240 V AC, 50/60 Hz
Interface Analog / RS-232 Control
Mounting Type Rack or Chamber Integrated
Protection Class IP20

Key Features and Benefits

The LAM 810-800256-207 combines precision power control, rugged reliability, and seamless integration to meet the high-performance demands of advanced plasma processing. Its 13.56 MHz RF output ensures compatibility with industry-standard plasma systems, providing the consistency required for submicron and nanometer-scale etching and deposition applications.

Its high-efficiency power conversion design reduces energy loss and heat generation, enhancing system efficiency and reliability. The integrated closed-loop feedback control ensures real-time monitoring and precise adjustment of output power, maintaining stable plasma characteristics even with process load fluctuations.

Built with robust protection circuitry, the LAM 810-800256-207 safeguards against overvoltage, overcurrent, and thermal overload, significantly extending component lifespan and minimizing maintenance needs. Advanced diagnostics and communication interfaces allow operators to monitor performance parameters, log faults, and optimize process recipes efficiently.

This power module’s compact and modular construction simplifies integration into existing Lam Research platforms such as the TCP, Rainbow, and 2300 series systems. Designed for continuous operation in cleanroom environments, it offers exceptional durability, minimal downtime, and repeatable performance that supports high-throughput semiconductor production.


Related Models

LAM 810-800256-205 – Previous version offering similar performance with standard firmware configuration.
LAM 810-800256-208 – Updated model featuring enhanced cooling and digital diagnostics interface.
LAM 810-800257-101 – Higher power variant for larger plasma chambers and multi-gas systems.
LAM 810-800260-002 – Compact RF generator optimized for low-power etching processes.
LAM 810-800254-104 – Compatible unit designed for older Lam Research etcher platforms.
LAM 810-800259-001 – Firmware-customized version for specialized deposition applications.
LAM 810-800261-103 – High-stability model for precision plasma control in R&D environments.
LAM 810-800256-206 – Direct predecessor with standard analog interface configuration.


Typical Application Areas

  • Semiconductor Manufacturing: RF power generation for etching, stripping, and PECVD systems.

  • Plasma Processing Equipment: Integration into Lam Research plasma chambers and OEM systems.

  • R&D Laboratories: High-stability plasma power source for thin-film and surface modification research.

We provide professional pre-sales and after-sales technical support, ensuring stable operation and long-term reliability. Each product comes with a one-year warranty. If you cannot find the model you need, please contact us immediately.

Contact Information:
WhatsApp: [https://wa.me/+86 19389860630]
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