AMAT 0100-20173 Product Description
Product Overview
The AMAT 0100-20173 is a high-precision vacuum valve, a critical component in semiconductor manufacturing and industrial vacuum systems. This valve is engineered to control the flow of gases in vacuum environments with exceptional accuracy, ensuring stable pressure levels and reliable process performance. The 0100-20173 features a robust design with advanced sealing technology, allowing it to maintain ultra-high vacuum conditions even in demanding operating environments. Its durable construction enables consistent performance under extreme temperatures, frequent cycling, and exposure to corrosive process gases. The AMAT 0100-20173 is designed for seamless integration into semiconductor fabrication tools, vacuum coating systems, and other high-tech industrial equipment, making it an essential solution for enhancing process control and yield in precision manufacturing.
Hainan Jinlin Mechanical & Electrical, a distributor of industrial control products, offers the AMAT 0100-20173 with adherence to the "Customer First, Forge Ahead" business philosophy, providing exceptional customer service.
Technical Specifications
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Parameter
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Value
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Product Model
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0100-20173
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Manufacturer
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AMAT
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Product Type
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Vacuum Valve
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Vacuum Rating
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Up to 10⁻⁹ Torr
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Body Material
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316L Stainless Steel
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Operating Temperature Range
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-20°C to 150°C
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Connection Size
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2.75 inch Conflat Flange
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Actuation Type
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Pneumatic
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Cycle Life
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≥ 1,000,000 operations
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Key Features and Benefits
Ultra-High Vacuum Performance
The
AMAT 0100-20173 is designed to achieve and maintain ultra-high vacuum levels up to 10⁻⁹ Torr, making it ideal for semiconductor manufacturing processes such as deposition, etching, and ion implantation. Its precision-engineered sealing surfaces and high-integrity gaskets minimize leak rates, ensuring that vacuum environments remain uncontaminated—critical for producing high-quality microchips and other sensitive electronic components. This level of vacuum performance directly contributes to improved process repeatability and reduced defect rates.
Corrosion Resistance
Constructed from 316L stainless steel, the 0100-20173 offers superior resistance to corrosion from aggressive process gases, including halogens, acids, and reactive plasmas commonly used in semiconductor fabrication. This material choice ensures long-term durability even in harsh chemical environments, reducing the need for frequent replacements and minimizing unplanned downtime. The valve’s internal components are also treated to withstand wear from particulate matter and gas flow, further extending its service life.
High Cycle Reliability
With a cycle life of ≥ 1,000,000 operations, the AMAT 0100-20173 is built to handle the high-frequency cycling demands of automated semiconductor manufacturing lines. Its pneumatic actuation system provides fast, consistent opening and closing times (≤ 0.5 seconds), ensuring rapid response to process control signals. This reliability is essential in high-throughput production environments, where equipment uptime directly impacts manufacturing efficiency and output.
Precision Flow Control
The
AMAT 0100-20173 features a precision-machined valve seat and poppet design that enables accurate flow control of process gases. This design minimizes pressure fluctuations when the valve opens or closes, preventing disruptions to sensitive vacuum processes. In applications such as thin-film deposition, where gas flow rates directly affect film uniformity, this level of control is critical for maintaining product quality and meeting strict manufacturing specifications.
Easy Integration and Maintenance
Designed for compatibility with standard vacuum system components, the 0100-20173 features a 2.75 inch Conflat flange connection, allowing for straightforward installation into existing vacuum lines. Its modular construction provides easy access to internal components, simplifying maintenance tasks such as gasket replacement or actuator servicing. This user-friendly design reduces installation time and maintenance costs, making it a practical choice for high-tech manufacturing facilities.
Related Models
- 0100-20174 – A larger variant with a 4.5 inch Conflat flange, suitable for higher gas flow applications in industrial vacuum systems.
- 0100-20172 – A smaller model with a 1.33 inch Conflat flange, ideal for low-flow precision vacuum applications such as analytical instrumentation.
- 0100-20175 – Equipped with an electric actuator for applications requiring precise position control or integration with digital control systems.
- 0100-20176 – Designed for high-temperature environments (up to 200°C), suitable for vacuum furnaces and thermal processing tools.
- 0100-20177 – Features enhanced particle resistance, making it ideal for vacuum systems handling abrasive materials or generating particulate byproducts.
- 0100-20178 – A bellows-sealed variant for ultra-clean applications, preventing contamination from external environments in semiconductor and pharmaceutical vacuum processes.
As a certified partner of industry leaders such as Bentley Nevada, Honeywell, and ABB, we provide the AMAT 0100-20173 for various application areas. In semiconductor manufacturing, it is widely used in wafer fabrication tools, ion implanters, and vacuum deposition systems. In industrial research, it contributes to the operation of analytical instruments and material science laboratories. In advanced manufacturing, it plays a role in vacuum coating and aerospace component production. We offer a one-year warranty for the AMAT 0100-20173. If you cannot find the model you need, please contact us immediately.
